利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

103 条记录 (耗时 0.029 秒)

    Method and device for irradiating spots on a layer
    1.
    发明申请
    Method and device for irradiating spots on a layer 有权
    用于在层上照射斑点的方法和装置

    公开(公告)号：US20070052936A1

    公开(公告)日：2007-03-08

    申请号：US10539313

    申请日：2003-11-20

    申请人： Jacobus Neijzen ,  Helmar Van Santen

    发明人： Jacobus Neijzen ,  Helmar Van Santen

    IPC分类号： G03B23/04

    CPC分类号： G03F7/70341 ,  G11B7/122 ,  G11B7/1374 ,  G11B7/261

    摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the lens is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the lens nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit. At least a portion of the liquid fills up a recess through which the radiation irradiates the spot.

    摘要翻译： 为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于透镜的相对运动，使得相继地照射该层的不同部分和透镜表面之间的间隙 最靠近层保持。 此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应导管供给。 至少一部分液体填充了辐射照射到该点的凹槽。

    Non-leaching adhesvie system and its use in a liquid immersion objective
    2.
    发明申请
    Non-leaching adhesvie system and its use in a liquid immersion objective 有权
    非浸出粘合体系及其在液浸物中的应用

    公开(公告)号：US20060225840A1

    公开(公告)日：2006-10-12

    申请号：US10568837

    申请日：2004-08-05

    申请人： Emile Verstegen ,  Johan Kloosterboer ,  Hendrik Stapert ,  Jacobus Neijzen ,  Helmar Van Santen

    发明人： Emile Verstegen ,  Johan Kloosterboer ,  Hendrik Stapert ,  Jacobus Neijzen ,  Helmar Van Santen

    IPC分类号： B32B37/12 ,  B32B38/00

    CPC分类号： C09J135/02

    摘要： A non-leaching adhesive system and its use in a liquid immersion objective for immersion-writing of masters for optical discs are disclosed. The adhesive system comprises at least one monomer, selected from among the group of acrylate and methacrylate monomers, allylic monomers, norbornene monomers, hybrid monomers thereof, containing chemically different polymeriazble groups, and multifunctional thiol monomers, provided that said thiol is used in combination with at least one of said non-thiol monomers; and a polymerization initiator. At least one of said monomers, not being a thiol, is provided with at least two functional polymerizable groups to obtain a crosslinked polymer network. The polymerization initiator is preferably an initiator that can be activated both thermally and with UV radiation. The adhesive system may further contain a reactive diluent. Further the use of the present adhesive system in mounting a liquid immersion objective is disclosed.

    摘要翻译： 公开了一种非浸出粘合剂系统及其在用于浸入式写入光盘的液浸物镜中的用途。 粘合剂体系包含至少一种选自丙烯酸酯和甲基丙烯酸酯单体的单体，烯丙基单体，降冰片烯单体，含有化学上不同的聚合物基团的杂化单体和多官能硫醇单体，条件是所述硫醇与 所述非硫醇单体中的至少一种; 和聚合引发剂。 至少一种所述单体（不是硫醇）具有至少两个官能的可聚合基团以获得交联的聚合物网络。 聚合引发剂优选是能够以热辐射和UV辐射活化的引发剂。 粘合剂体系还可以含有反应性稀释剂。 此外，公开了本发明的粘合剂系统在安装液浸物镜中的用途。

    Imprint lithography
    3.
    发明申请
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US20060154179A1

    公开(公告)日：2006-07-13

    申请号：US11030326

    申请日：2005-01-07

    申请人： Helmar Van Santen ,  Aleksey Kolesnychenko ,  Jacobus Neijzen ,  Emile Verstegen

    发明人： Helmar Van Santen ,  Aleksey Kolesnychenko ,  Jacobus Neijzen ,  Emile Verstegen

    IPC分类号： G03C5/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprinting method is disclosed which involves irradiating a photo-curable imprintable medium in a flowable state on a substrate with radiation to initiate curing of the medium, after the irradiating, contacting the medium with a template to form an imprint in the medium, allowing the medium to substantially cure such that the medium is in a substantially non-flowable state while the medium is contacted by the template, and separating the template from the medium while the medium is in the substantially non-flowable state.

    摘要翻译： 公开了一种压印方法，其包括在辐射下以可流动状态在基板上照射可光固化的可印刷介质以引发介质的固化，在照射之后，使介质与模板接触以在介质中形成印记， 介质基本上固化，使得介质处于基本不可流动的状态，同时介质与模板接触，并且当介质处于基本上不可流动的状态时将模板与介质分离。

    Method and device for irradiating spots on a layer
    4.
    发明申请
    Method and device for irradiating spots on a layer 有权
    用于在层上照射斑点的方法和装置

    公开(公告)号：US20060209414A1

    公开(公告)日：2006-09-21

    申请号：US10539351

    申请日：2003-11-20

    申请人： Helmar Van Santen ,  Jacobus Neijzen

    发明人： Helmar Van Santen ,  Jacobus Neijzen

    IPC分类号： G02B1/10

    CPC分类号： G03F7/70341 ,  G11B7/122 ,  G11B7/1374 ,  G11B7/261

    摘要： For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.

    摘要翻译： 为了照射层，辐射束被引导并聚焦到层上的斑点，引起层相对于光学元件的相对运动，使得相继地照射该层的不同部分，并且在该层的表面之间的间隙 保持最靠近层的光学元件。 此外，辐射照射到层上的斑点的间隙的至少一部分保持充满液体，液体经由供应管道供给，并通过总投影横截面通过面积流出流出开口 在与平面平行的平面上。 流出开口或多个流出开口定位成使得从垂直于该层的方向看，总横截面积在该空间部分中的中心，辐射辐射穿过该点。

    Photolithographic process, stamper, use of said stamper and optical data storage medium
    5.
    发明申请
    Photolithographic process, stamper, use of said stamper and optical data storage medium 审中-公开
    光刻工艺，压模，使用所述压模和光学数据存储介质

    公开(公告)号：US20060246378A1

    公开(公告)日：2006-11-02

    申请号：US10553720

    申请日：2004-04-22

    申请人： Jacobus Neijzen ,  Helmar Van Santen

    发明人： Jacobus Neijzen ,  Helmar Van Santen

    IPC分类号： G03F7/26

    CPC分类号： G11B7/263 ,  G03F7/0015 ,  G03F7/30 ,  G11B7/261

    摘要： A photolithographic process is described. It comprises the steps of: applying a photoresist layer (2) on a substrate (1), locally exposing the photoresist layer (2) to a radiation source with a suitable wavelength, providing a suitable liquid developer composition on the substrate (1), dissolving an exposed or unexposed region of the photoresist layer (2) with the developer composition, rinsing and drying the photoresist layer (2) thereby interrupting said dissolving step. The substrate (1) has a metallic surface (1c) in contact with the photoresist layer (2) and the photoresist layer (2) has a thickness dr

    摘要翻译： 描述光刻工艺。 它包括以下步骤：将光致抗蚀剂层（2）施加到基底（1）上，将光刻胶层（2）局部地曝光到具有合适波长的辐射源上，在基底（1）上提供合适的液体显影剂组合物， 用显影剂组合物溶解光致抗蚀剂层（2）的曝光或未曝光区域，漂洗并干燥光致抗蚀剂层（2），从而中断所述溶解步骤。 基板（1）具有与光致抗蚀剂层（2）接触的金属表面（1c），并且光致抗蚀剂层（2）的厚度dr <100nm。 达到70度以上的相对高的光致抗蚀剂壁陡度。 该方法可以用于通过使用通过所述方法生产的压模（3）来生产高密度光学数据存储介质。