发明申请
- 专利标题: Method for manufacturing semiconductor device and laser irradiation apparatus
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申请号: US11412075申请日: 2006-04-27
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公开(公告)号: US20060246693A1公开(公告)日: 2006-11-02
- 发明人: Koichiro Tanaka , Hirotada Oishi
- 申请人: Koichiro Tanaka , Hirotada Oishi
- 优先权: JP2005-133731 20050428
- 主分类号: H01L21/36
- IPC分类号: H01L21/36 ; B23K26/00 ; H01L21/84
摘要:
It is an object to achieve continuous crystal growth without optical interference using a compact laser irradiation apparatus. A megahertz laser beam is split and combined to crystallize a semiconductor film. At this point of time, an optical path difference is provided between the split beams to reduce optical interference. The optical path difference is set to have a length equivalent to the pulse width of the megahertz laser beam or more and less than a length equivalent to the pulse repetition interval; thus, optical interference can be suppressed with a very short optical path difference. Therefore, laser beams can be applied continuously and efficiently without energy deterioration.
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