发明申请
US20060254922A1 Method of depositing films on aluminum alloys and films made by the method
审中-公开
通过该方法在铝合金和薄膜上沉积薄膜的方法
- 专利标题: Method of depositing films on aluminum alloys and films made by the method
- 专利标题(中): 通过该方法在铝合金和薄膜上沉积薄膜的方法
-
申请号: US11384208申请日: 2006-03-17
-
公开(公告)号: US20060254922A1公开(公告)日: 2006-11-16
- 发明人: Dmitri Brevnov , Tim Olson
- 申请人: Dmitri Brevnov , Tim Olson
- 专利权人: Science & Technology Corporation @ UNM
- 当前专利权人: Science & Technology Corporation @ UNM
- 主分类号: C25D5/34
- IPC分类号: C25D5/34
摘要:
Method for depositing a metallic material on an aluminum alloy surface for galvanic displacement type deposition, electrodeposition or electroless deposition of a metallic film on the surface wherein the alloy surface is oxidized (e.g. anodized) to form aluminum oxide and the oxidized surface is etched to leave a partial thickness of a barier aluminum oxide on the alloy surface. The partial thickness of the barrier oxide is controlled by etching to form a porous, metallic particulate film for a thin barrier oxide, or a continuous metallic film for thicker barrier oxide. The metallic film then is electrodeposited or electroless deposited on the barrier film.
信息查询