发明申请
US20060254922A1 Method of depositing films on aluminum alloys and films made by the method 审中-公开
通过该方法在铝合金和薄膜上沉积薄膜的方法

Method of depositing films on aluminum alloys and films made by the method
摘要:
Method for depositing a metallic material on an aluminum alloy surface for galvanic displacement type deposition, electrodeposition or electroless deposition of a metallic film on the surface wherein the alloy surface is oxidized (e.g. anodized) to form aluminum oxide and the oxidized surface is etched to leave a partial thickness of a barier aluminum oxide on the alloy surface. The partial thickness of the barrier oxide is controlled by etching to form a porous, metallic particulate film for a thin barrier oxide, or a continuous metallic film for thicker barrier oxide. The metallic film then is electrodeposited or electroless deposited on the barrier film.
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