发明申请
- 专利标题: Semiconductor superjunction device
- 专利标题(中): 半导体超级连接装置
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申请号: US11370188申请日: 2006-03-08
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公开(公告)号: US20060256487A1公开(公告)日: 2006-11-16
- 发明人: Daisuke Kishimoto , Susumu Iwamoto , Katsunori Ueno
- 申请人: Daisuke Kishimoto , Susumu Iwamoto , Katsunori Ueno
- 申请人地址: JP Kawasaki ku
- 专利权人: FUJI ELECTRIC HOLDING CO., LTD.
- 当前专利权人: FUJI ELECTRIC HOLDING CO., LTD.
- 当前专利权人地址: JP Kawasaki ku
- 优先权: JPPA2005-064376 20050308
- 主分类号: H02H7/00
- IPC分类号: H02H7/00
摘要:
A semiconductor superjunction device has a superjunction structure formed in a drift region of the device. The superjunction structure has alternately arranged n-type regions and p-type semiconductor regions layered parallel with the drift direction of carriers, permitting current flow when turned ON and depleting when turned OFF. It also includes a first intrinsic semiconductor region between the n-type and p-type regions. The first intrinsic semiconductor region and the n-type and p-type regions sandwiching the first intrinsic semiconductor region forming a unit. A plurality of units are repetitively arranged to form a repetitively arranged structure. The value of mobility of one of electrons in the n-type region or holes in the p-type region is equal to or less than half the value of mobility of corresponding to one of electrons or holes in the first intrinsic semiconductor region. The superjunction structure eliminates the lower limit that prevents further narrowing of the widths of the n-type and p-type regions to further improve the tradeoff relationship between increasing the breakdown voltage and reducing the on-resistance.
公开/授权文献
- US07355257B2 Semiconductor superjunction device 公开/授权日:2008-04-08
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