发明申请
- 专利标题: Semiconductor device and method for manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11436178申请日: 2006-05-17
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公开(公告)号: US20060261491A1公开(公告)日: 2006-11-23
- 发明人: Kaoru Soeta , Daisuke Takai
- 申请人: Kaoru Soeta , Daisuke Takai
- 专利权人: ALPS ELECTRIC CO., LTD.
- 当前专利权人: ALPS ELECTRIC CO., LTD.
- 优先权: JP2005-145243 20050518
- 主分类号: H01L23/52
- IPC分类号: H01L23/52
摘要:
The present invention relates to a semiconductor device and a method for manufacturing the same that prevent deformation or cracking caused by a difference in coefficient of thermal expansion. Elastic contacts provided on upper and lower surfaces of an interposer are elastically biased against the relatively displaced electrodes. The interposer thus compensates for displacement caused by different coefficients of thermal expansion so that an electrical connection between the electrodes of the first electronic component and the electrodes of the second electronic component is constantly maintained. Accordingly, this prevents separation or cracking in electrode connection areas.
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