发明申请
- 专利标题： Periodic patterns and technique to control misalignment between two layers
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申请号： US11495001申请日： 2006-07-27
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公开(公告)号： US20060262326A1公开(公告)日： 2006-11-23
- 发明人: Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
- 申请人： Ibrahim Abdulhalim , Mike Adel , Michael Friedmann , Michael Faeyrman
- 主分类号： G01B11/14
- IPC分类号： G01B11/14
摘要：
A method and system to measure misalignment error between two overlying or interlaced periodic structures are proposed. The overlying or interlaced periodic structures are illuminated by incident radiation, and the diffracted radiation of the incident radiation by the overlying or interlaced periodic structures are detected to provide an output signal. The misalignment between the overlying or interlaced periodic structures may then be determined from the output signal.
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