发明申请
US20060265700A1 Method and apparatus for pattern-based system design analysis
审中-公开
用于基于模式的系统设计分析的方法和装置
- 专利标题： Method and apparatus for pattern-based system design analysis
- 专利标题（中）： 用于基于模式的系统设计分析的方法和装置
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申请号： US11134062申请日： 2005-05-20
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公开(公告)号： US20060265700A1公开(公告)日： 2006-11-23
- 发明人: Deepak Alur , John Crupi , Daniel Malks , Yury Kamen , Syed Ali , Rajmohan Krishnamurthy , Michael Godfrey
- 申请人： Deepak Alur , John Crupi , Daniel Malks , Yury Kamen , Syed Ali , Rajmohan Krishnamurthy , Michael Godfrey
- 申请人地址： US CA Santa Clara
- 专利权人： Sun Microsystems, Inc.
- 当前专利权人： Sun Microsystems, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： G06F9/45
- IPC分类号： G06F9/45
摘要：
A method for analyzing a target system that includes obtaining a plurality of characteristics from the target system using a characteristics extractor, wherein the plurality of characteristics is associated with a characteristics model, storing each of the plurality of characteristics in a characteristics store, and analyzing the target system by issuing at least one query to the characteristics store to obtain an analysis result.