发明申请
- 专利标题： MICROELECTROMECHANICAL STRUCTURE AND A METHOD FOR MAKING THE SAME
- 专利标题（中）： 微电子结构及其制造方法
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申请号： US10805610申请日： 2004-03-18
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公开(公告)号： US20060266730A1公开(公告)日： 2006-11-30
- 发明人: Jonathan Doan , Satyadev Patel
- 申请人： Jonathan Doan , Satyadev Patel
- 主分类号： B44C1/22
- IPC分类号： B44C1/22 ; C23F1/00
摘要：
A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.
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