发明申请
US20060269867A1 Antireflective hardmask composition and methods for using same
审中-公开
防反射硬掩模组合物及其使用方法
- 专利标题： Antireflective hardmask composition and methods for using same
- 专利标题（中）： 防反射硬掩模组合物及其使用方法
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申请号： US11348063申请日： 2006-02-06
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公开(公告)号： US20060269867A1公开(公告)日： 2006-11-30
- 发明人: Dong Uh , Chang Oh , Do Kim , Jin Lee , Irina Nam
- 申请人： Dong Uh , Chang Oh , Do Kim , Jin Lee , Irina Nam
- 优先权： KR2005-44935 20050527
- 主分类号： G03C1/00
- IPC分类号： G03C1/00
摘要：
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include: a) a polymer component, including a first monomeric unit and a second monomeric unit, wherein both the first monomeric unit and the second monomeric unit include an aromatic group, and wherein at least one of the first monomeric unit and the second monomeric unit includes a phenol group; b) a crosslinking component; and c) an acid catalyst.
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