发明申请
- 专利标题: METHOD FOR DIRECT METALLIZATION OF NON-CONDUCTING SUBSTRATES
- 专利标题(中): 非导电基板的直接金属化方法
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申请号: US11423474申请日: 2006-06-12
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公开(公告)号: US20060280872A1公开(公告)日: 2006-12-14
- 发明人: Andreas Konigshofen , Andreas Mobius
- 申请人: Andreas Konigshofen , Andreas Mobius
- 申请人地址: US CT West Haven
- 专利权人: ENTHONE INC.
- 当前专利权人: ENTHONE INC.
- 当前专利权人地址: US CT West Haven
- 优先权: DE102005027123.5 20050610
- 主分类号: B05D3/00
- IPC分类号: B05D3/00
摘要:
In the plating of non-conductive substrates, a metal-salt solution for treatment of such a substrate having been treated with a metal colloid for activation, and associated method for coating non-conductive substrates, characterized by reduced incrustation the associated equipment; the metal-salt solution comprising a metal that can be reduced by the metal of the metal colloid, a complexing agent, and a metal salt having a metal of the group consisting of lithium, sodium, calcium, rubidium, and cesium in the form of a salt selected from the group consisting of fluorides, chlorides, iodides, bromides, nitrates, sulphates, and mixtures thereof.
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