发明申请
US20060280872A1 METHOD FOR DIRECT METALLIZATION OF NON-CONDUCTING SUBSTRATES 审中-公开
非导电基板的直接金属化方法

  • 专利标题: METHOD FOR DIRECT METALLIZATION OF NON-CONDUCTING SUBSTRATES
  • 专利标题(中): 非导电基板的直接金属化方法
  • 申请号: US11423474
    申请日: 2006-06-12
  • 公开(公告)号: US20060280872A1
    公开(公告)日: 2006-12-14
  • 发明人: Andreas KonigshofenAndreas Mobius
  • 申请人: Andreas KonigshofenAndreas Mobius
  • 申请人地址: US CT West Haven
  • 专利权人: ENTHONE INC.
  • 当前专利权人: ENTHONE INC.
  • 当前专利权人地址: US CT West Haven
  • 优先权: DE102005027123.5 20050610
  • 主分类号: B05D3/00
  • IPC分类号: B05D3/00
METHOD FOR DIRECT METALLIZATION OF NON-CONDUCTING SUBSTRATES
摘要:
In the plating of non-conductive substrates, a metal-salt solution for treatment of such a substrate having been treated with a metal colloid for activation, and associated method for coating non-conductive substrates, characterized by reduced incrustation the associated equipment; the metal-salt solution comprising a metal that can be reduced by the metal of the metal colloid, a complexing agent, and a metal salt having a metal of the group consisting of lithium, sodium, calcium, rubidium, and cesium in the form of a salt selected from the group consisting of fluorides, chlorides, iodides, bromides, nitrates, sulphates, and mixtures thereof.
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