发明申请
- 专利标题： Laser beam irradiation apparatus and pattern drawing method
- 专利标题（中）： 激光束照射装置和图案绘制方法
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申请号： US11514165申请日： 2006-09-01
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公开(公告)号： US20060289412A1公开(公告)日： 2006-12-28
- 发明人: Shiro Hamada
- 申请人： Shiro Hamada
- 专利权人： SUMITOMO HEAVY INDUSTRIES, LTD.
- 当前专利权人： SUMITOMO HEAVY INDUSTRIES, LTD.
- 主分类号： B23K26/06
- IPC分类号： B23K26/06 ; B23K26/067
摘要：
A laser source emits a laser beam. A diffractive optical element is disposed at a position which the laser beam emitted from the laser source is incident on. The diffractive optical element splits the incident laser beam into laser beams. The laser beams are incident on a first zoom lens system. The first zoom lens system focuses the incident laser beams onto a first virtual plane.
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IPC分类:
