发明申请
- 专利标题: Silicon wafer with non-soluble protective coating
- 专利标题(中): 具有不溶性保护涂层的硅片
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申请号: US11159515申请日: 2005-06-22
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公开(公告)号: US20060289966A1公开(公告)日: 2006-12-28
- 发明人: Ashay Dani , Gudbjorg Oskarsdottir , James Matayabas
- 申请人: Ashay Dani , Gudbjorg Oskarsdottir , James Matayabas
- 主分类号: H01L23/58
- IPC分类号: H01L23/58 ; H01L21/822
摘要:
A silicon wafer with an array of integrated circuit (IC) dies formed on the wafer is provided with a protective coat applied to a surface of the wafer to protect the IC dies from debris created during a laser scribing process. The IC dies can include die bumps that can be adversely affected by debris from the laser scribing process. The protective coat is a tape or a film that may be optically transparent, chemically non-reactive to the laser energy and formed of material that can be ablated by the laser scribing. The protective coat is removed from the IC dies after laser scribing leaving the IC dies and die bumps clean of any debris, thereby decreasing the number of defective dies.
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