发明申请
US20060292728A1 Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same
有权
氮化物晶体,氮化物晶体衬底,含外延层的氮化物晶体衬底,半导体器件及其制造方法
- 专利标题: Nitride crystal, nitride crystal substrate, epilayer-containing nitride crystal substrate, semiconductor device and method of manufacturing the same
- 专利标题(中): 氮化物晶体,氮化物晶体衬底,含外延层的氮化物晶体衬底,半导体器件及其制造方法
-
申请号: US11473122申请日: 2006-06-23
-
公开(公告)号: US20060292728A1公开(公告)日: 2006-12-28
- 发明人: Keiji Ishibashi , Tokiko Kaji , Seiji Nakahata , Takayuki Nishiura
- 申请人: Keiji Ishibashi , Tokiko Kaji , Seiji Nakahata , Takayuki Nishiura
- 专利权人: SUMITOMO ELECTRI INDUSTRIES, LTD.
- 当前专利权人: SUMITOMO ELECTRI INDUSTRIES, LTD.
- 优先权: JPJP2005-183111 20050623
- 主分类号: C30B33/06
- IPC分类号: C30B33/06 ; H01L21/00 ; H01L33/00
摘要:
A nitride crystal is characterized in that, in connection with plane spacing of arbitrary specific parallel crystal lattice planes of the nitride crystal obtained from X-ray diffraction measurement performed with variation of X-ray penetration depth from a surface of the crystal while X-ray diffraction conditions of the specific parallel crystal lattice planes are satisfied, a uniform distortion at a surface layer of the crystal represented by a value of |d1−d2|/d2 obtained from the plane spacing d1 at the X-ray penetration depth of 0.3 μm and the plane spacing d2 at the X-ray penetration depth of 5 μm is equal to or lower than 2.1×10−3. The above configuration provides the nitride crystal having a crystal surface layer that is evaluated directly and reliably without breaking the crystal so that it can be used in a preferred fashion as a substrate for a semiconductor device as well as the nitride crystal substrate, an epilayer-containing nitride crystal substrate, a semiconductor device and a method of manufacturing the same.
公开/授权文献
信息查询
IPC分类: