- 专利标题: CIRCUITRY COMPONENT AND METHOD FOR FORMING THE SAME
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申请号: US11426317申请日: 2006-06-26
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公开(公告)号: US20060292851A1公开(公告)日: 2006-12-28
- 发明人: Mou-Shiung Lin , Chien-Kang Chou , Ke-Hung Chen
- 申请人: Mou-Shiung Lin , Chien-Kang Chou , Ke-Hung Chen
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763
摘要:
A circuit structure includes a semiconductor substrate, first and second metallic posts over the semiconductor substrate, an insulating layer over the semiconductor substrate and covering the first and second metallic posts, first and second bumps over the first and second metallic posts or over the insulating layer. The first and second metallic posts have a height of between 20 and 300 microns, with the ratio of the maximum horizontal dimension thereof to the height thereof being less than 4. The distance between the center of the first bump and the center of the second bump is between 10 and 250 microns.
公开/授权文献
- US07582556B2 Circuitry component and method for forming the same 公开/授权日:2009-09-01
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