发明申请
US20070007621A1 Fuse breakdown method adapted to semiconductor device 审中-公开
适用于半导体器件的保险丝击穿法

Fuse breakdown method adapted to semiconductor device
摘要:
A plurality of pulses each having relatively low energy are consecutively applied to a subject fuse to cause breakdown, wherein the total energy of pulses is set in light of a prescribed breakdown threshold, which is calculated in advance. The subject fuse has a pair of terminals and an interconnection portion that is narrowly constricted in the middle so as to realize fuse breakdown with ease. A pulse generator generates pulses, which are repeatedly applied to the subject fuse by way of a transistor; then, it stops generating pulses upon detection of fuse breakdown. Side wall spacers are formed on side walls of fuses, which are processed in a tapered shape so as to reduce thermal stress applied to coating insulating films. In addition, pulse energy is appropriately determined so as to cause electro-migration in the subject fuse, which is thus increased in resistance without causing instantaneous meltdown or evaporation.
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