发明申请
- 专利标题： Process solutions containing surfactants
- 专利标题（中）： 含有表面活性剂的工艺溶液
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申请号： US11520971申请日： 2006-09-14
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公开(公告)号： US20070010409A1公开(公告)日： 2007-01-11
- 发明人: Peng Zhang , Danielle Curzi , Eugene Karwacki , Leslie Barber
- 申请人： Peng Zhang , Danielle Curzi , Eugene Karwacki , Leslie Barber
- 主分类号： A61Q5/02
- IPC分类号： A61Q5/02
摘要：
Process solutions comprising one or more surfactants are used to reduce the number of pattern collapse defects on a plurality of photoresist coated substrates during the manufacture of semiconductor devices.
公开/授权文献
- US07591270B2 Process solutions containing surfactants 公开/授权日：2009-09-22
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