发明申请
- 专利标题: Semiconductor test device using leakage current and compensation system of leakage current
- 专利标题(中): 半导体测试装置采用漏电流补偿系统的漏电流
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申请号: US11510621申请日: 2006-08-28
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公开(公告)号: US20070018679A1公开(公告)日: 2007-01-25
- 发明人: Kwang-Il Kim
- 申请人: Kwang-Il Kim
- 优先权: KR2003-53860 20030804; KR2003-53861 20030804; KR2004-31461 20040504
- 主分类号: G01R31/26
- IPC分类号: G01R31/26
摘要:
The present invention relates to a semiconductor test device which may use a leakage current and/or a compensation system of leakage current. The semiconductor test device, according to exemplary embodiments of the present invention, may include MOS transistors which may be fabricated in processes similar to those of the semiconductor device. The semiconductor test device may sense the leakage currents which may flow in the MOS transistors, may test whether the semiconductor device may be fabricated normally or abnormally, and may generate at least a normal or abnormal signal as a result. The leakage current compensation device may compensate for the leakage current which may flow in the semiconductor device in response to the normal or abnormal signal of the semiconductor test device. According to exemplary embodiments of the present invention, abnormally-fabricated MOS transistors may be tested and malfunctions of the semiconductor device may be reduced by the leakage current compensation device.
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