Invention Application
US20070024938A1 Method and apparatus using hologram masks for printing composite patterns onto large substrates 审中-公开
使用全息掩模将复合图案印刷到大基板上的方法和装置

  • Patent Title: Method and apparatus using hologram masks for printing composite patterns onto large substrates
  • Patent Title (中): 使用全息掩模将复合图案印刷到大基板上的方法和装置
  • Application No.: US11188816
    Application Date: 2005-07-26
  • Publication No.: US20070024938A1
    Publication Date: 2007-02-01
  • Inventor: Francis Clube
  • Applicant: Francis Clube
  • Assignee: Holoptics SA
  • Current Assignee: Holoptics SA
  • Main IPC: G03H1/20
  • IPC: G03H1/20
Method and apparatus using hologram masks for printing composite patterns onto large substrates
Abstract:
A method for printing a composite pattern into a photosensitive layer on a substrate which includes arranging a hologram mask on a first face of a coupling element; arranging the substrate substantially parallel and in proximity to the hologram mask and such that the substrate is laterally positioned with respect to the pattern recorded in the hologram mask; printing the pattern in focus into a part of the photosensitive layer by scanning an exposure beam over the hologram mask and reconstructing the pattern recorded therein while simultaneously measuring the local separation of the substrate and hologram mask where reconstruction is taking place by scanning a focus beam over the hologram mask and continuously correcting the separation by displacing the hologram mask and coupling element; and repeating said arranging and printing steps to print again the pattern into an unexposed part of the photosensitive layer.
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