公开(公告)号：US20130329203A1

公开(公告)日：2013-12-12

申请号：US13885808

申请日：2011-11-16

Applicant: Harun H. Solak ,  Francis Clube

Inventor： Harun H. Solak ,  Francis Clube

IPC: G03F7/20

CPC classification number: G03F7/70058 ,  G03F1/28 ,  G03F7/70408

Abstract: A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer. The method includes providing a mask bearing a pattern of at least two overlapping sub-patterns which have a second symmetry and a second period, the features of each sub-pattern being formed in a transmissive material, providing a substrate bearing the layer, arranging the mask with a separation from the substrate, providing light having a central wavelength for illuminating the mask to generate a light-field in which light of the central wavelength forms a range of intensity distributions between Talbot planes, illuminating said mask pattern with said light while maintaining the separation or changing it by a distance whereby the photosensitive layer is exposed to an average of the range of intensity distributions, wherein the light transmitted by each sub-pattern is shifted in phase relative to that transmitted by another sub-pattern.

Abstract translation: 一种用于将具有第一对称性和第一周期的周期性图案印刷到感光层中的方法。 该方法包括提供具有至少两个具有第二对称性和第二周期的重叠子图案的图案的掩模，每个子图案的特征形成在透射材料中，提供承载该层的基底， 掩模，与衬底分离，提供具有用于照亮掩模的中心波长的光以产生光场，其中中心波长的光形成Talbot平面之间的强度分布范围，用所述光照亮所述掩模图案，同时保持 分离或改变一段距离，由此光敏层暴露于强度分布范围的平均值，其中由每个子图案发送的光相对于由另一子图案传输的光相位移位。

公开(公告)号：US08368871B2

公开(公告)日：2013-02-05

申请号：US12706081

申请日：2010-02-16

Applicant: Harun H. Solak ,  Christian Dais ,  Francis Clube

Inventor： Harun H. Solak ,  Christian Dais ,  Francis Clube

IPC: G03B27/52

CPC classification number: G03F7/70408 ,  G03B27/58 ,  G03F7/70325 ,  G03F7/7035

Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

Abstract translation: 与Talbot成像相关的平版印刷方法，用于将至少一个方向上周期性或准周期性的所需特征图案打印到基底表面上，该方法包括提供具有掩模特征图案的掩模，将基片平行放置 靠近掩模，提供具有中心波长和光谱带宽的照明源，从所述源形成具有强度角度分布的照明光束，将衬底距离掩模布置并将掩模图案暴露于所述光束，从而 照明的每个角度分量使衬底基本上暴露在用于照明波长的连续Talbot像面之间出现的横向强度分布的整个范围内，其中光束的角分布结合掩模中的特征图案设计， 衬底与掩模的距离。

公开(公告)号：US20180364586A1

公开(公告)日：2018-12-20

申请号：US16061041

申请日：2016-12-14

Applicant: FRANCIS CLUBE ,  HARUN SOLAK

Inventor： FRANCIS CLUBE ,  HARUN SOLAK

IPC: G03F7/20

CPC classification number: G03F7/70408 ,  G03F7/70091 ,  G03F7/7035

Abstract: A method for printing a desired periodic pattern into a photosensitive layer on a substrate includes providing a mask bearing a periodic pattern whose period is a multiple of that of the desired pattern. The substrate is disposed in proximity to the mask, at least one beam is provided for illuminating the mask pattern to generate a transmitted light-field described by a Talbot distance. The layer is exposed to time-integrated intensity distributions in a number of sub-exposures by illuminating the mask pattern with the at least one beam while changing the separation between substrate and mask by at least a certain fraction of, but less than, the Talbot distance. The illumination or the substrate is configured relative to the mask for the different sub-exposures so that the layer is exposed to the same time-integrated intensity distributions that are mutually laterally offset by a certain distance and in a certain direction.

公开(公告)号：US09182672B2

公开(公告)日：2015-11-10

申请号：US13997335

申请日：2011-12-20

Applicant: Harun Solak ,  Francis Clube

Inventor： Harun Solak ,  Francis Clube

IPC: G03F7/20

CPC classification number: G03F7/201 ,  G03F7/70408

Abstract: A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

Abstract translation: 一种方法和装置将周期特征的图案打印到感光层中。 所述方法包括以下步骤：提供承载该层的衬底，提供掩模，布置衬底，使得掩模在与其垂直的第一平面中相对于衬底具有倾斜角，并提供用于照亮掩模图案的准直光 以产生由Talbot距离分开的Talbot平面之间的横向强度分布范围组成的透射光场，使得透射的光场在第一平面中具有强度包络。 在平行于第一平面的方向和衬底上相对于掩模移动衬底的情况下，用光照亮面罩。 倾斜角度和强度包络被布置成使得该层暴露于横向强度分布范围的平均值。

公开(公告)号：US08904316B2

公开(公告)日：2014-12-02

申请号：US13885808

申请日：2011-11-16

Applicant: Harun H. Solak ,  Francis Clube

Inventor： Harun H. Solak ,  Francis Clube

IPC: G06F17/50 ,  G03F7/20 ,  G03F1/28

CPC classification number: G03F7/70058 ,  G03F1/28 ,  G03F7/70408

Abstract: A method for printing a periodic pattern having a first symmetry and a first period into a photosensitive layer. The method includes providing a mask bearing a pattern of at least two overlapping sub-patterns which have a second symmetry and a second period, the features of each sub-pattern being formed in a transmissive material, providing a substrate bearing the layer, arranging the mask with a separation from the substrate, providing light having a central wavelength for illuminating the mask to generate a light-field in which light of the central wavelength forms a range of intensity distributions between Talbot planes, illuminating said mask pattern with said light while maintaining the separation or changing it by a distance whereby the photosensitive layer is exposed to an average of the range of intensity distributions, wherein the light transmitted by each sub-pattern is shifted in phase relative to that transmitted by another sub-pattern.

Abstract translation: 一种用于将具有第一对称性和第一周期的周期性图案印刷到感光层中的方法。 该方法包括提供具有至少两个具有第二对称性和第二周期的重叠子图案的图案的掩模，每个子图案的特征形成在透射材料中，提供承载该层的基底， 掩模，与衬底分离，提供具有用于照亮掩模的中心波长的光以产生光场，其中中心波长的光形成Talbot平面之间的强度分布范围，用所述光照亮所述掩模图案，同时保持 分离或改变一段距离，由此光敏层暴露于强度分布范围的平均值，其中由每个子图案发送的光相对于由另一子图案传输的光相位移位。

公开(公告)号：US20110199598A1

公开(公告)日：2011-08-18

申请号：US12706081

申请日：2010-02-16

Applicant: Harun H. Solak ,  Christian Dais ,  Francis Clube

Inventor： Harun H. Solak ,  Christian Dais ,  Francis Clube

IPC: G03B27/54

CPC classification number: G03F7/70408 ,  G03B27/58 ,  G03F7/70325 ,  G03F7/7035

Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

Abstract translation: 与Talbot成像相关的平版印刷方法，用于将至少一个方向上周期性或准周期性的所需特征图案打印到基底表面上，该方法包括提供具有掩模特征图案的掩模，将基片平行放置 靠近掩模，提供具有中心波长和光谱带宽的照明源，从所述源形成具有强度角度分布的照明光束，将衬底距离掩模布置并将掩模图案暴露于所述光束，从而 照明的每个角度分量使衬底基本上暴露在用于照明波长的连续Talbot像面之间出现的横向强度分布的整个范围内，其中光束的角分布结合掩模中的特征图案设计， 衬底与掩模的距离。

公开(公告)号：US20060044637A1

公开(公告)日：2006-03-02

申请号：US11217189

申请日：2005-09-01

Applicant: Herbert Mayer ,  Francis Clube ,  Ali Nobari

Inventor： Herbert Mayer ,  Francis Clube ,  Ali Nobari

IPC: G03H1/20

CPC classification number: G03H1/0005 ,  G03H1/0408 ,  G03H2001/0094 ,  G03H2001/0232 ,  G03H2223/18

Abstract: A method and apparatus for automatically printing a pattern of features from a plurality of hologram masks on a lithographic machine, which method includes arranging the plurality of hologram masks on first faces of a plurality of prisms such that the pattern of features recorded in each hologram mask can be printed by an exposure beam illuminating second faces of the plurality of prisms; providing an exposure position at which any of the prisms and hologram masks can be arranged such that the patterns recorded in the hologram mask can be printed; providing a prism storage and transport system in which the prisms and hologram masks not at the exposure position can be arranged and for transporting the prisms and hologram masks between any of the exposure position and prism storage positions; and providing a control system for the prism transport and storage system.

Abstract translation: 一种用于在光刻机上自动打印多个全息掩模的特征图案的方法和装置，该方法包括将多个全息掩模布置在多个棱镜的第一面上，使得记录在每个全息掩模中的特征图案 可以通过照射多个棱镜的第二面的曝光束来印刷; 提供可以布置任何棱镜和全息图掩模的曝光位置，使得记录在全息掩模中的图案可以被印刷; 提供棱镜存储和传送系统，其中可以布置不在曝光位置的棱镜和全息图掩模，并且用于在任何曝光位置和棱镜存储位置之间传送棱镜和全息掩模; 并提供棱镜运输和存储系统的控制系统。

公开(公告)号：US20220155691A1

公开(公告)日：2022-05-19

申请号：US17598409

申请日：2020-03-27

Applicant: Francis Clube ,  Andreas Amrein ,  Maxime Lebugle ,  Harun Solak ,  Li Wang

Inventor： Francis Clube ,  Andreas Amrein ,  Maxime Lebugle ,  Harun Solak ,  Li Wang

IPC: G03F7/20 ,  G03F1/70 ,  G02B5/18

Abstract: A method for forming a surface-relief grating with a desired spatial variation of duty cycle in a layer of photoresist includes: providing a first mask bearing a high-resolution grating of linear features, arranging the first mask at a first distance from a substrate, providing a second mask bearing a variable-transmission grating of opaque and transparent linear features that has a designed spatial variation of duty cycle, arranging the second mask at a distance before the first mask such that the linear features of the variable-transmission grating are orthogonal to the linear features of the high-resolution grating, illuminating the second mask while varying the first distance according to displacement Talbot lithography and also displacing the second mask at an angle to its linear features such that there is substantially no component of modulation with the period of the variable-transmission grating in the energy density distribution that exposes the photoresist.

公开(公告)号：US09036133B2

公开(公告)日：2015-05-19

申请号：US13218657

申请日：2011-08-26

Applicant: Harun H. Solak ,  Christian Dais ,  Francis Clube

Inventor： Harun H. Solak ,  Christian Dais ,  Francis Clube

IPC: G03B27/32 ,  G03B27/54 ,  G03B27/58 ,  G03F7/20

CPC classification number: G03B27/58 ,  G03B27/54 ,  G03F7/201 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70408

Abstract: A lithographic method related to Talbot imaging for printing a desired pattern of features that is periodic or quasi-periodic in at least one direction onto a substrate surface, which method includes providing a mask bearing a pattern of mask features, arranging the substrate parallel and in proximity to the mask, providing an illumination source having a central wavelength and a spectral bandwidth, forming from said source an illumination beam with an angular distribution of intensity, arranging the distance of the substrate from the mask and exposing the mask pattern to said beam so that each angular component of illumination exposes the substrate to substantially the entire range of lateral intensity distributions that occur between successive Talbot image planes for the illumination wavelengths, wherein the angular distribution of the beam is designed in conjunction with the pattern of features in the mask and the distance of the substrate from the mask.

Abstract translation: 与Talbot成像相关的平版印刷方法，用于将至少一个方向上周期性或准周期性的所需特征图案打印到基底表面上，该方法包括提供具有掩模特征图案的掩模，将基片平行放置 靠近掩模，提供具有中心波长和光谱带宽的照明源，从所述源形成具有强度角度分布的照明光束，将衬底距离掩模布置并将掩模图案暴露于所述光束，从而 照明的每个角度分量使衬底基本上暴露在用于照明波长的连续Talbot像面之间出现的横向强度分布的整个范围内，其中光束的角分布结合掩模中的特征图案设计， 衬底与掩模的距离。

公开(公告)号：US20130323651A1

公开(公告)日：2013-12-05

申请号：US13997335

申请日：2011-12-20

Applicant: Harun Solak ,  Francis Clube

Inventor： Harun Solak ,  Francis Clube

IPC: G03F7/20

CPC classification number: G03F7/201 ,  G03F7/70408

Abstract: A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.

Abstract translation: 一种方法和装置将周期特征的图案打印到感光层中。 所述方法包括以下步骤：提供承载该层的衬底，提供掩模，布置衬底，使得掩模在与其垂直的第一平面中相对于衬底具有倾斜角，并提供用于照亮掩模图案的准直光 以产生由Talbot距离分开的Talbot平面之间的横向强度分布范围组成的透射光场，使得透射的光场在第一平面中具有强度包络。 在平行于第一平面的方向和衬底上相对于掩模移动衬底的情况下，用光照亮面罩。 倾斜角度和强度包络被布置成使得该层暴露于横向强度分布范围的平均值。