发明申请
US20070025907A1 NANO-TIP FABRICATION BY SPATIALLY CONTROLLED ETCHING 有权
通过空间控制蚀刻的纳米技术制造

NANO-TIP FABRICATION BY SPATIALLY CONTROLLED ETCHING
摘要:
A method of fabricating nano-tips involves placing a precursor nanotip with an apex and shank in a vacuum chamber; optionally applying an electric field to the precursor nanotip to remove oxide and other contaminant species; subsequently admitting an etchant gas to the vacuum chamber to perform field assisted etching by preferential adsorption of the etchant gas on the shank; and gradually reducing the applied electric field to confine the adsorption of the etchant gas to the shank as etching progresses.
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