发明申请
US20070026324A1 Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film
审中-公开
具有遮光膜的基板，滤色器基板，两者的制造方法以及具有带有遮光膜的基板的显示装置
- 专利标题： Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film
- 专利标题（中）： 具有遮光膜的基板，滤色器基板，两者的制造方法以及具有带有遮光膜的基板的显示装置
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申请号： US11484606申请日： 2006-07-12
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公开(公告)号： US20070026324A1公开(公告)日： 2007-02-01
- 发明人: Takuji Yoshida , Hatsumi Kimura , Nobuaki Ishiga , Takahito Yamabe , Toshio Araki
- 申请人： Takuji Yoshida , Hatsumi Kimura , Nobuaki Ishiga , Takahito Yamabe , Toshio Araki
- 申请人地址： JP Chiyoda-ku
- 专利权人： MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人： MITSUBISHI ELECTRIC CORPORATION
- 当前专利权人地址： JP Chiyoda-ku
- 优先权： JP2005-218152 20050728; JP2006-127403 20060501
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F1/08
摘要：
A substrate with a light-shielding film according to one mode of the invention is obtained in a method of manufacture of a substrate with a light-shielding film having a light-shielding film pattern formed on a substrate, by depositing in order a first film having chromium oxide and a second film having chromium on a substrate, to form a multilayer film; forming a resist pattern on the multilayer film; performing etching of the multilayer film, using an etching liquid comprising ceric ammonium nitrate to which nitric acid is added at a concentration of at least 2.5 mol/liter, to form a light-shielding film pattern; and removing the resist pattern.
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