Invention Application
US20070030948A1 Illumination system with field mirrors for producing uniform scanning energy
审中-公开
具有现场镜的照明系统，用于产生均匀的扫描能量
- Patent Title: Illumination system with field mirrors for producing uniform scanning energy
- Patent Title (中): 具有现场镜的照明系统，用于产生均匀的扫描能量
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Application No.: US11581053Application Date: 2006-10-13
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Publication No.: US20070030948A1Publication Date: 2007-02-08
- Inventor: Wolfgang Singer , Joachim Hainz , Hans-Joachim Frasch , Johannes Wangler , Joachim Wietzorrek , Jorg Schultz
- Applicant: Wolfgang Singer , Joachim Hainz , Hans-Joachim Frasch , Johannes Wangler , Joachim Wietzorrek , Jorg Schultz
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Priority: DE1033472 20030730; WOPCT/EP00/07258 20000708; DE19908526 19990226; DE29902108 19990208; DE19903807 19990202; DE19819898 19980505; DE19819898.1 19980505; DE19903807.4 19990202; DE29902108.4 19990208; DEDE29902108.4 19990208; DEDE19903807.4 19990202; DEDE19819898.1 19980505
- Main IPC: G21K5/00
- IPC: G21K5/00
Abstract:
This invention relates to an illumination system for scanning lithography especially for wavelengths ≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.
Information query
