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    Illumination system for microlithography
    1.
    发明申请
    Illumination system for microlithography 有权
    微光刻照明系统

    公开(公告)号：US20070058274A1

    公开(公告)日：2007-03-15

    申请号：US10563175

    申请日：2004-04-13

    申请人： Wolfgang Singer ,  Joachim Wietzorrek ,  Joachim Hainz ,  Gabriele Weirauch ,  Manfred Maul

    发明人： Wolfgang Singer ,  Joachim Wietzorrek ,  Joachim Hainz ,  Gabriele Weirauch ,  Manfred Maul

    IPC分类号： G02B5/08

    CPC分类号： G03F7/702 ,  G02B17/0647 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06

    摘要： The present invention relates to an illumination system for microlithography, especially for wavelengths ≦193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.

    摘要翻译： 本发明涉及用于微光刻的照明系统，特别是对于<= 193nm的波长，特别优选用于用至少一个光学积分器照射场平面中的场的EUV光刻，所述光学积分器将由光源发射的光束分成 多个光通道各自具有光强度，其特征在于，在从光源到场平面的光路中提供滤光器，滤光器包括滤光元件，其以如下方式配置，使得光 在过滤元件之后的光路中减少至少一个光通道。

    Illumination system for microlithography
    6.
    发明授权
    Illumination system for microlithography 有权
    微光刻照明系统

    公开(公告)号：US07911584B2

    公开(公告)日：2011-03-22

    申请号：US10563175

    申请日：2004-04-13

    申请人： Wolfgang Singer ,  Joachim Wietzorrek ,  Joachim Hainz ,  Gabriele Weirauch ,  Manfred Maul

    发明人： Wolfgang Singer ,  Joachim Wietzorrek ,  Joachim Hainz ,  Gabriele Weirauch ,  Manfred Maul

    IPC分类号： G03B27/54

    CPC分类号： G03F7/702 ,  G02B17/0647 ,  G03F7/70233 ,  G03F7/70358 ,  G21K1/06

    摘要： The present invention relates to an illumination system for microlithography, especially for wavelengths ≦193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity,characterized in thata filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.

    摘要翻译： 本发明涉及用于微光刻的照明系统，特别是对于波长为193nm的照明系统，特别优选用于用至少一个光学积分器照射场平面中的场的EUV光刻，所述光学积分器将由光源发射的光束分成 多个光通道各自具有光强度，其特征在于，在从光源到场平面的光路中提供滤光器，滤光器包括滤光元件，其以如下方式配置，使得光 在过滤元件之后的光路中减少至少一个光通道。

    Excitation and Imaging Optics for Fluorescence Detection
    10.
    发明申请
    Excitation and Imaging Optics for Fluorescence Detection 有权
    激光和成像光学荧光检测

    公开(公告)号：US20100019157A1

    公开(公告)日：2010-01-28

    申请号：US12506792

    申请日：2009-07-21

    申请人： Alan Furlan ,  Joachim Wietzorrek

    发明人： Alan Furlan ,  Joachim Wietzorrek

    IPC分类号： G01T1/20

    CPC分类号： G02B27/0018 ,  G01N21/6452 ,  G02B3/0056 ,  G02B3/0062 ,  G02B21/16 ,  G02B2207/113

    摘要： The invention concerns an optical instrument for imaging fluorescence signals from an arrangement of a plurality of individual detection sites, for example the wells of a microtitre plate. In order to improve the light yield of the fluorescence excitation with excitation light as well as the light yield of the detection of the fluorescence signals, an objective array is provided which is arranged in the beam path between the field lens and the detection sites and comprises a field lens array with field lens array elements and a pupil lens array with pupil lens array elements. In order to improve the channel separation and suppress interfering light the objective array can comprise a diaphragm array with in each case two diaphragm openings per detection site.

    摘要翻译： 本发明涉及一种用于从多个单独检测位置（例如微量滴定板的孔）的布置成像荧光信号的光学仪器。 为了提高用激发光的荧光激发的光产率以及荧光信号的检测的光产率，提供了一种物镜阵列，其布置在场透镜和检测点之间的光束路径中，并且包括 具有场透镜阵列元件的场透镜阵列和具有光瞳透镜阵列元件的光瞳透镜阵列。 为了改善通道分离并抑制干扰光，物镜阵列可以包括隔膜阵列，每个检测位置都有两个隔膜孔。