发明申请
- 专利标题： Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof
- 专利标题（中）： 缺陷检查装置，其灵敏度校准方法，缺陷检测灵敏度校准用基板及其制造方法
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申请号： US11287314申请日： 2005-11-28
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公开(公告)号： US20070035725A1公开(公告)日： 2007-02-15
- 发明人: Naohiro Takahashi , Tamihide Yasumoto
- 申请人： Naohiro Takahashi , Tamihide Yasumoto
- 申请人地址： JP Kawasaki
- 专利权人： FUJITSU LIMITED
- 当前专利权人： FUJITSU LIMITED
- 当前专利权人地址： JP Kawasaki
- 优先权： JP2005-233644 20050811
- 主分类号： G01N21/00
- IPC分类号： G01N21/00 ; G01J1/10
摘要：
A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.
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