发明申请
- 专利标题: Apparatus and method for controlled particle beam manufacturing
- 专利标题(中): 受控粒子束制造的装置和方法
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申请号: US11484015申请日: 2006-07-10
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公开(公告)号: US20070045534A1公开(公告)日: 2007-03-01
- 发明人: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
- 申请人: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
- 主分类号: G21K7/00
- IPC分类号: G21K7/00
摘要:
A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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