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公开(公告)号：US20070045534A1
公开(公告)日：2007-03-01
申请号：US11484015
申请日：2006-07-10
Applicant: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
Inventor： Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
IPC: G21K7/00
CPC classification number: H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
Abstract translation: 用于将工件暴露于带电粒子的室包括用于产生带电粒子流的带电粒子源，准直器，被配置为沿着轴准直和引导带电粒子流从带电粒子源流出，准直器下游的光束数字化器 被配置为通过调整沿着轴的带电粒子之间的纵向间隔来创建包括至少一个带电粒子的组的数字光束，所述光束数字转换器的下游的偏转器包括沿轴线纵向设置以偏转数字光束的一系列偏转级， 以及构造成保持工件的偏转器下游的工件台。
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公开(公告)号：US08278027B2
公开(公告)日：2012-10-02
申请号：US13188377
申请日：2011-07-21
Applicant: Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
Inventor： Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
IPC: G03C5/00
CPC classification number: H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01L21/0331 , H01L21/0332 , H01L21/0337 , H01L21/26533 , H01L21/28123 , H01L21/30621 , H01L29/66659 , H01L29/7835 , Y10S430/143
Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
Abstract translation: 制造工艺技术使用聚焦离子束工艺在第一层上创建图案。 该图案被转移到第二层，其可以用作传统的蚀刻停止层。 图案可以形成在第二层上，而不用光线通过掩模版而没有湿化学显影，从而实现适形覆盖和非常精细的关键特征控制。 公开了两种暗场图案和光场图案，其可以实现聚焦离子束的减少或最小曝光。
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公开(公告)号：US20120028464A1
公开(公告)日：2012-02-02
申请号：US13188377
申请日：2011-07-21
Applicant: Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
Inventor： Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
IPC: H01L21/44
CPC classification number: H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01L21/0331 , H01L21/0332 , H01L21/0337 , H01L21/26533 , H01L21/28123 , H01L21/30621 , H01L29/66659 , H01L29/7835 , Y10S430/143
Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
Abstract translation: 制造工艺技术使用聚焦离子束工艺在第一层上创建图案。 该图案被转移到第二层，其可以用作传统的蚀刻停止层。 图案可以形成在第二层上，而不用光线通过掩模版而没有湿化学显影，从而实现适形覆盖和非常精细的关键特征控制。 公开了两种暗场图案和光场图案，其可以实现聚焦离子束的减少或最小的曝光。
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公开(公告)号：US07993813B2
公开(公告)日：2011-08-09
申请号：US11944360
申请日：2007-11-21
Applicant: Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
Inventor： Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
IPC: G03C5/00
CPC classification number: H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01L21/0331 , H01L21/0332 , H01L21/0337 , H01L21/26533 , H01L21/28123 , H01L21/30621 , H01L29/66659 , H01L29/7835 , Y10S430/143
Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
Abstract translation: 制造工艺技术使用聚焦离子束工艺在第一层上创建图案。 该图案被转移到第二层，其可以用作传统的蚀刻停止层。 图案可以形成在第二层上，而不用光线通过掩模版而没有湿化学显影，从而实现适形覆盖和非常精细的关键特征控制。 公开了两种暗场图案和光场图案，其可以实现聚焦离子束的减少或最小的曝光。
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公开(公告)号：US20070278428A1
公开(公告)日：2007-12-06
申请号：US11841724
申请日：2007-08-20
Applicant: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
Inventor： Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
IPC: H01J37/08
CPC classification number: H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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Patent Agency Ranking
公开(公告)号：US20070278419A1
公开(公告)日：2007-12-06
申请号：US11841608
申请日：2007-08-20
Applicant: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
Inventor： Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
CPC classification number: H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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公开(公告)号：US20070278418A1
公开(公告)日：2007-12-06
申请号：US11841593
申请日：2007-08-20
Applicant: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
Inventor： Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
CPC classification number: H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
Abstract translation: 用于将工件暴露于带电粒子的室包括用于产生带电粒子流的带电粒子源，准直器，被配置为沿着轴准直和引导带电粒子流从带电粒子源流出，准直器下游的光束数字化器 被配置为通过调整沿着轴的带电粒子之间的纵向间隔来创建包括至少一个带电粒子的组的数字光束，所述光束数字转换器的下游的偏转器包括沿轴线纵向设置以偏转数字光束的一系列偏转级， 以及构造成保持工件的偏转器下游的工件台。
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公开(公告)号：US20080160431A1
公开(公告)日：2008-07-03
申请号：US11944360
申请日：2007-11-21
Applicant: Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
Inventor： Jeffrey Scott , Michael Zani , Mark Bennahmias , Mark Mayse
IPC: G03F1/00 , H01L21/3105 , H01L21/3065 , G03C1/00 , H01L21/306
CPC classification number: H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3177 , H01L21/0331 , H01L21/0332 , H01L21/0337 , H01L21/26533 , H01L21/28123 , H01L21/30621 , H01L29/66659 , H01L29/7835 , Y10S430/143
Abstract: A manufacturing process technology creates a pattern on a first layer using a focused ion beam process. The pattern is transferred to a second layer, which may act as a traditional etch stop layer. The pattern can be formed on the second layer without irradiation by light through a reticle and without wet chemical developing, thereby enabling conformal coverage and very fine critical feature control. Both dark field patterns and light field patterns are disclosed, which may enable reduced or minimal exposure by the focused ion beam.
Abstract translation: 制造工艺技术使用聚焦离子束工艺在第一层上创建图案。 该图案被转移到第二层，其可以用作传统的蚀刻停止层。 图案可以形成在第二层上，而不用光线通过掩模版而没有湿化学显影，从而实现适形覆盖和非常精细的关键特征控制。 公开了两种暗场图案和光场图案，其可以实现聚焦离子束的减少或最小的曝光。
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公开(公告)号：US20070284695A1
公开(公告)日：2007-12-13
申请号：US11841630
申请日：2007-08-20
Applicant: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
Inventor： Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
CPC classification number: H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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公开(公告)号：US20070284538A1
公开(公告)日：2007-12-13
申请号：US11841583
申请日：2007-08-20
Applicant: Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
Inventor： Michael Zani , Mark Bennahmias , Mark Mayse , Jeffrey Scott
CPC classification number: H01J37/3056 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/3007 , H01J37/304 , H01J37/3172 , H01J37/3174 , H01J37/3177 , H01J2237/0432 , H01J2237/047 , H01J2237/30472 , H01J2237/31713 , H01J2237/31732 , H01J2237/31735 , H01J2237/31737 , H01J2237/3174 , H01J2237/31749 , H01J2237/3175 , H01J2237/31766 , H01L21/265 , H01L21/26513 , H01L21/76267 , H01L21/84 , H01L27/0629 , H01L29/66462 , H01L29/66659 , Y10T428/24802 , Y10T428/24893
Abstract: A chamber for exposing a workpiece to charged particles includes a charged particle source for generating a stream of charged particles, a collimator configured to collimate and direct the stream of charged particles from the charged particle source along an axis, a beam digitizer downstream of the collimator configured to create a digital beam including groups of at least one charged particle by adjusting longitudinal spacing between the charged particles along the axis, a deflector downstream of the beam digitizer including a series of deflection stages disposed longitudinally along the axis to deflect the digital beams, and a workpiece stage downstream of the deflector configured to hold the workpiece.
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