Invention Application
US20070046954A1 Method of verifying consistent measurement between a plurality of CD metrology tools 审中-公开
验证多个CD测量工具之间的一致测量的方法

Method of verifying consistent measurement between a plurality of CD metrology tools
Abstract:
A method of matching CD-SEM's to ensure consistent measurements over an installed base of SEM's is disclosed by measuring with each of a plurality of scanning electron microscopes the feature size of resist features in at least two positions on the substrate such that field-to-field variations, and reticle and exposure tool non-uniformities are efficiently suppressed in the matching result.
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