发明申请
- 专利标题： Pre-measurement processing method, exposure system and substrate processing apparatus
- 专利标题（中）： 预测量处理方法，曝光系统和基板处理装置
-
申请号： US11513161申请日： 2006-08-31
-
公开(公告)号： US20070052939A1公开(公告)日： 2007-03-08
- 发明人: Yuuki Ishii , Hiroyuki Suzuki , Shinichi Okita
- 申请人： Yuuki Ishii , Hiroyuki Suzuki , Shinichi Okita
- 申请人地址： JP Tokyo 100-8331
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo 100-8331
- 优先权： JP2004-056167 20040301
- 主分类号： G03B27/42
- IPC分类号： G03B27/42
摘要：
high performance and high quality micro devices, etc. are produced highly efficiently at a high throughput. Before transferring a wafer W to an exposure apparatus 200 for exposing the wafer W, marks formed on the wafer W is measured by an in-line measurement device 400 and a measurement result and/or a result of performing calculation processing on the measurement result is notified to the exposure apparatus 200. In the exposure apparatus 200, a measurement condition is optimized based on the notified result and an alignment processing and other processing are performed.