Invention Application
- Patent Title: Photosensitive resin composition
- Patent Title (中): 感光树脂组合物
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Application No.: US11519790Application Date: 2006-09-13
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Publication No.: US20070059638A1Publication Date: 2007-03-15
- Inventor: Osamu Namba , Satoru Uchidoi
- Applicant: Osamu Namba , Satoru Uchidoi
- Priority: JP2005-267205 20050914
- Main IPC: G03C1/00
- IPC: G03C1/00

Abstract:
The present invention provides a photosensitive resin composition having improved stability in a bright room, which can provide a printing plate material having superior image remaining property and printing durability, which can be subjected to alkaline development. Accordingly, the present invention relates to a photosensitive resin composition comprising an ethylenically unsaturated compound, an alkali-soluble resin, a near-infrared-absorbing dye, a halomethyl group-containing compound, a nitroxyl compound and an organo boron anion-containing compound, and a printing plate material comprising a substrate and a photosensitive layer formed by applying the photosensitive resin composition on the substrate.
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