发明申请
- 专利标题: Gallium nitride crystal substrate and method of producing same
- 专利标题(中): 氮化镓晶体基板及其制造方法
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申请号: US11602948申请日: 2006-11-22
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公开(公告)号: US20070062440A1公开(公告)日: 2007-03-22
- 发明人: Fumitaka Sato , Seiji Nakahata
- 申请人: Fumitaka Sato , Seiji Nakahata
- 专利权人: SUMITOMO ELECTRIC INDUSTRIES LTD.
- 当前专利权人: SUMITOMO ELECTRIC INDUSTRIES LTD.
- 优先权: JP041140/2006 20060217; JPJP2001-284323 20010919; JPJP2002-230925 20020808
- 主分类号: C30B25/00
- IPC分类号: C30B25/00 ; C30B23/00 ; C30B28/12 ; C30B28/14
摘要:
A low-distortion gallium nitride crystal substrate including low dislocation single crystal regions (Z) having a definite c-axis and a definite a-axis, C-plane growth regions (Y) having a c-axis and a-axis parallel to the c-axis and a-axis of the low dislocation single crystal regions (Z), voluminous defect accumulating regions (H) having a c-axis inverse to the c-axis of the low dislocation single crystal regions (Z) and an a-axis parallel with the a-axis of the low dislocation single crystal regions (Z), and 0.1/cm2 to 10/cm2 c-axis gross core regions (F) containing at least one crystal having a c-axis parallel to the c-axis of the low dislocation single crystal regions (Z) and an a-axis different from the a-axis of the low dislocation single crystal regions (Z).
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