Invention Application
- Patent Title: Method of forming contact layers on substrates
- Patent Title (中): 在基片上形成接触层的方法
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Application No.: US11232718Application Date: 2005-09-21
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Publication No.: US20070066054A1Publication Date: 2007-03-22
- Inventor: Cyprian Uzoh , Bulent Basol , Hung-Ming Wang , Homayoun Talieh
- Applicant: Cyprian Uzoh , Bulent Basol , Hung-Ming Wang , Homayoun Talieh
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
A method is provided for manufacturing removable contact structures on the surface of a substrate to conduct electricity from a contact member to the surface during electroprocessing. The method comprises forming a conductive layer on the surface. A predetermined region of the conductive layer is selectively coated by a contact layer so that the contact member touches the contact layer as the electroprocessing is performed on the conductive layer.
Public/Granted literature
- US07416975B2 Method of forming contact layers on substrates Public/Granted day:2008-08-26
Information query
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