发明申请
- 专利标题: Nitride semiconductor device
- 专利标题(中): 氮化物半导体器件
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申请号: US11525012申请日: 2006-09-22
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公开(公告)号: US20070069234A1公开(公告)日: 2007-03-29
- 发明人: Jong Won , Soo Kim , Jae Han , Seong Lee
- 申请人: Jong Won , Soo Kim , Jae Han , Seong Lee
- 专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- 优先权: KR10-2005-0088772 20050923
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
A nitride semiconductor device is provided. In the device, first and second conductivity type nitride layers are formed. An active layer is formed between the first and second conductivity type nitride layers. The active layer includes at least one quantum barrier layer and at least one quantum well layer. Also, a current spreading layer is interposed between the first conductivity type nitride layer and the active layer. The current spreading layer has an In content greater than the quantum well layer of the active layer.
公开/授权文献
- US07718992B2 Nitride semiconductor device 公开/授权日:2010-05-18
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