发明申请
US20070070334A1 Defect inspection apparatus 有权
缺陷检查装置

  • 专利标题: Defect inspection apparatus
  • 专利标题(中): 缺陷检查装置
  • 申请号: US11526638
    申请日: 2006-09-26
  • 公开(公告)号: US20070070334A1
    公开(公告)日: 2007-03-29
  • 发明人: Riki OgawaSoichiro Mitsui
  • 申请人: Riki OgawaSoichiro Mitsui
  • 优先权: JP2005-284395 20050929
  • 主分类号: G01N21/88
  • IPC分类号: G01N21/88
Defect inspection apparatus
摘要:
A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.
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