发明申请
- 专利标题: Defect inspection apparatus
- 专利标题(中): 缺陷检查装置
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申请号: US11526638申请日: 2006-09-26
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公开(公告)号: US20070070334A1公开(公告)日: 2007-03-29
- 发明人: Riki Ogawa , Soichiro Mitsui
- 申请人: Riki Ogawa , Soichiro Mitsui
- 优先权: JP2005-284395 20050929
- 主分类号: G01N21/88
- IPC分类号: G01N21/88
摘要:
A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.
公开/授权文献
- US07491959B2 Defect inspection apparatus 公开/授权日:2009-02-17
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