公开(公告)号：US08072592B2

公开(公告)日：2011-12-06

申请号：US12985849

申请日：2011-01-06

申请人： Toshiyuki Watanabe ,  Riki Ogawa

发明人： Toshiyuki Watanabe ,  Riki Ogawa

IPC分类号： G01N21/00 ,  G01N21/88

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

公开(公告)号：US20100247085A1

公开(公告)日：2010-09-30

申请号：US12729307

申请日：2010-03-23

申请人： Masataka Shiratsuchi ,  Yoshinori Honguh ,  Masatoshi Hirono ,  Riki Ogawa ,  Shinji Sugihara

发明人： Masataka Shiratsuchi ,  Yoshinori Honguh ,  Masatoshi Hirono ,  Riki Ogawa ,  Shinji Sugihara

IPC分类号： G03B13/00

CPC分类号： G03B13/00

摘要： In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.

摘要翻译： 在自动聚焦调节机构中，将具有图案化表面的测试样品安装在安装台上，并且将通过形成在场停止器中的狭缝的光束施加到测试样品的图案化表面。 从测试样品反射的光束被分成两段光束。 在分段光束的光路上设置聚焦调节孔径，具有形成菱形的各个孔。 穿过菱形孔的分段光束的量由光接收单元检测。 基于检测到的光量之差，通过焦点调节单元来控制安装台的位置。

公开(公告)号：US07495779B2

公开(公告)日：2009-02-24

申请号：US12031223

申请日：2008-02-14

申请人： Riki Ogawa

发明人： Riki Ogawa

IPC分类号： G01B11/00 ,  G01B11/14 ,  G02B27/40

CPC分类号： G02B7/32 ,  G01N21/9501

摘要： A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target object surface by illumination light passing through the illumination slit and focuses reflected light from the target object surface, first and second detection slits which are arranged in front of and in back of a focal point and in each of which a second opening is formed such that a short side of a rectangle is shorter than a short side of a illumination slit image formed by the illumination slit and a long side of the rectangle is larger than a long side of the illumination slit image, first and second light amount sensors configured to detect amounts of light of the reflected lights passing through the first and second detection slits, and a calculating unit configured to calculate a level of the target object surface based on outputs from the first and second light amount sensors.

摘要翻译： 电平检测装置包括形成有使得照明光通过的矩形第一开口的照明狭缝，被配置为通过照射光照射目标物体表面的光学系统，并且聚焦来自目标物体表面的反射光 第一和第二检测狭缝，其布置在焦点的前面和后面，并且每个检测狭缝形成有第二开口，使得矩形的短边短于由 所述照明狭缝和所述矩形的长边大于所述照明狭缝图像的长边，被配置为检测通过所述第一和第二检测狭缝的反射光的光量的第一和第二光量传感器，以及计算 被配置为基于来自第一和第二光量传感器的输出来计算目标物体表面的等级。

公开(公告)号：US20080239290A1

公开(公告)日：2008-10-02

申请号：US12047554

申请日：2008-03-13

申请人： Toshiyuki WATANABE ,  Riki Ogawa

发明人： Toshiyuki WATANABE ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G01N2021/95676 ,  G03F1/84

摘要： A reticle defect inspection apparatus that can carry out a defect inspection with high detection sensitivity are provided. The apparatus includes an optical system of transmitted illumination for irradiating one surface of a sample with a first inspection light, an optical system of reflected illumination for irradiating another surface of the sample with a second inspection light, and a detecting optical system that can simultaneously detect a transmitted light obtained by the first inspection light being passed through the sample and a reflected light obtained by the second inspection light being reflected by the sample. And the optical system of transmitted illumination includes a focusing lens driving mechanism for correcting a focal point shift of the transmitted light resulting from thickness of the sample.

摘要翻译： 提供了能够进行高检测灵敏度的缺陷检查的掩模版缺陷检查装置。 该装置包括用于利用第一检查光照射样品的一个表面的透射照明的光学系统，用第二检查光照射样品的另一个表面的反射照明的光学系统，以及可以同时检测的检测光学系统 通过第一检查光通过样品而获得的透射光和由第二检查光获得的反射光被样品反射。 并且透射照明的光学系统包括用于校正由样品的厚度产生的透射光的焦点偏移的聚焦透镜驱动机构。

公开(公告)号：US07123345B2

公开(公告)日：2006-10-17

申请号：US10897120

申请日：2004-07-23

申请人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

发明人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

IPC分类号： G03B27/42

CPC分类号： G03F9/7088 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

摘要翻译： 一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测 检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量 当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

公开(公告)号：US20080259328A1

公开(公告)日：2008-10-23

申请号：US12047844

申请日：2008-03-13

申请人： Ryoichi HIRANO ,  Riki Ogawa

发明人： Ryoichi HIRANO ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/95607 ,  G01N2021/95676 ,  G01N2201/0631

摘要： A reticle defect inspection apparatus that suppresses deterioration of optical components resulting from luminescent spots generated by an integrator and can sustain a defect inspection with high precision for a long time is provided. The reticle defect inspection apparatus is a reticle defect inspection apparatus for inspecting for defects on a reticle using a pattern image obtained by irradiating the reticle on which a pattern is formed with light. And the apparatus includes an illuminating optical system for irradiating the reticle with an inspection light and a detecting optical system for detecting a pattern image of the reticle irradiated with the inspection light, wherein the illuminating optical system comprises an integrator for equalizing illumination distribution of the inspection light and a moving mechanism for enabling the integrator to slightly move in a direction perpendicular to an optical axis of the integrator.

摘要翻译： 提供了一种掩模版缺陷检查装置，其抑制由积分器产生的发光点导致的光学部件的劣化，并且能够长期高精度地进行缺陷检查。 掩模版缺陷检查装置是使用通过用光照射其上形成图案的掩模版获得的图案图像来检查掩模版上的缺陷的掩模版缺陷检查装置。 该装置包括用于用检查光照射标线的照明光学系统和用于检测用检查光照射的掩模版的图案图像的检测光学系统，其中照明光学系统包括用于均衡检查的照明分布的积分器 光和移动机构，用于使积分器能够在垂直于积分器的光轴的方向上稍微移动。

公开(公告)号：US20080231846A1

公开(公告)日：2008-09-25

申请号：US12031223

申请日：2008-02-14

申请人： Riki OGAWA

发明人： Riki OGAWA

IPC分类号： G01N21/00

CPC分类号： G02B7/32 ,  G01N21/9501

摘要： A level detection apparatus includes an illumination slit in which a rectangular first opening which causes illumination light to pass is formed, an optical system configured to illuminate a target object surface by illumination light passing through the illumination slit and focuses reflected light from the target object surface, first and second detection slits which are arranged in front of and in back of a focal point and in each of which a second opening is formed such that a short side of a rectangle is shorter than a short side of a illumination slit image formed by the illumination slit and a long side of the rectangle is larger than a long side of the illumination slit image, first and second light amount sensors configured to detect amounts of light of the reflected lights passing through the first and second detection slits, and a calculating unit configured to calculate a level of the target object surface based on outputs from the first and second light amount sensors.

摘要翻译： 电平检测装置包括形成有使得照明光通过的矩形第一开口的照明狭缝，被配置为通过照射光照射目标物体表面的光学系统，并且聚焦来自目标物体表面的反射光 第一和第二检测狭缝，其布置在焦点的前面和后面，并且每个检测狭缝形成有第二开口，使得矩形的短边短于由 所述照明狭缝和所述矩形的长边大于所述照明狭缝图像的长边，所述第一和第二光量传感器被配置为检测穿过所述第一和第二检测狭缝的反射光的光量，以及计算 被配置为基于来自第一和第二光量传感器的输出来计算目标物体表面的等级。

公开(公告)号：US20080204737A1

公开(公告)日：2008-08-28

申请号：US12035685

申请日：2008-02-22

申请人： Riki OGAWA ,  Masatoshi HIRONO

发明人： Riki OGAWA ,  Masatoshi HIRONO

IPC分类号： G01N21/00

CPC分类号： G01N21/956 ,  G03F1/84

摘要： A semiconductor device fabrication-use mask pattern inspection apparatus having an optical configuration adaptable for achievement of a Koehler illumination system using a light source high in spatial coherency is disclosed. This apparatus includes a laser light source, a beam expander which is disposed between the laser source and a mask for expanding laser light to form an optical path of collimated light rays, and a beam splitter placed in the collimated light ray optical path for splitting the optical path into two optical paths. In one of these paths, a transmissive illumination optics is placed which irradiates transmission light onto the mask; in the other path, a reflective illumination optics is placed for irradiation of reflected light onto the mask. A pattern image of this mask is detected by a photosensitive device to generate a detected pattern image, which is sent to a comparator for comparison with a fiducial image thereof.

摘要翻译： 公开了一种具有适于实现使用高空间一致性的光源的科勒照明系统的光学配置的半导体器件制造用掩模图案检查装置。 该装置包括激光源，扩束器，其布置在激光源和用于扩展激光的掩模之间以形成准直光线的光路;以及分束器，其布置在准直光线光路中，用于将 光路进入两个光路。 在这些路径之一中，放置透射照明光学器件，其将透射光照射到掩模上; 在另一路径中，放置反射照明光学器件以将反射光照射到掩模上。 通过感光装置检测该掩模的图案图像以产生检测到的图案图像，该检测图案图像被发送到比较器以与其基准图像进行比较。

公开(公告)号：US07388660B2

公开(公告)日：2008-06-17

申请号：US11344205

申请日：2006-02-01

申请人： Noboru Kobayashi ,  Riki Ogawa ,  Masayuki Hideshima ,  Hiroyuki Nagahama ,  Koji Nakajima

发明人： Noboru Kobayashi ,  Riki Ogawa ,  Masayuki Hideshima ,  Hiroyuki Nagahama ,  Koji Nakajima

IPC分类号： G01J1/00

CPC分类号： G01J1/36 ,  G01J1/04 ,  G01J1/044 ,  G01J1/18

摘要： A device for measuring the intensity of incoming light is disclosed. This device includes a rotatable light blocking unit which interrupts incident signal light at short regular intervals. The device also includes a light source which emits certain light different from the signal light while the signal light is interrupted by the block unit, and a measurement unit for measuring intensity values of the signal light and the certain light. A correction unit is provided for correcting the measured signal light intensity based on the certain light intensity. A calculator unit calculates a correction value through comparison of the intensity of the certain light to a reference value. The correction unit uses this correction value to correct the signal light intensity.

摘要翻译： 公开了一种用于测量入射光强度的装置。 该装置包括可旋转的光阻挡单元，其以规则间隔的短时间中断入射信号光。 该装置还包括在信号光被块单元中断时发出与信号光不同的特定光的光源，以及用于测量信号光和特定光的强度值的测量单元。 提供校正单元，用于基于特定光强度校正测量的信号光强度。 计算器单元通过将特定光的强度与参考值进行比较来计算校正值。 校正单元使用该校正值来校正信号光强度。

公开(公告)号：US20050213084A1

公开(公告)日：2005-09-29

申请号：US11083323

申请日：2005-03-18

申请人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

发明人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

IPC分类号： G01N21/88 ,  G01N21/956 ,  G03F1/84 ,  H01L21/027

CPC分类号： G01N21/956

摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.

摘要翻译： 一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射在其上形成有图案（6）的掩模（4）上的不同区域（14a，14b），物镜（OL） 以及至少一对具有检测传感器（17,19）的检测光学系统（15,16），以形成图案的图像，并且用于通过该目标接收来自每个不同区域的照明光 每个检测光学系统具有用于调整光圈角度的机构（13a，13b）。