Invention Application
- Patent Title: Method for manufacturing a micro-electro-mechanical structure
- Patent Title (中): 微电子机械结构的制造方法
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Application No.: US11239259Application Date: 2005-09-29
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Publication No.: US20070072428A1Publication Date: 2007-03-29
- Inventor: Dan Chilcott
- Applicant: Dan Chilcott
- Main IPC: H01L21/311
- IPC: H01L21/311

Abstract:
A technique for manufacturing a micro-electro-mechanical (MEM) structure includes a number of steps. Initially, a substrate is provided. Next, a plurality of trenches are etched into the substrate with a first etch. Then, a charging layer is formed at a bottom of each of the trenches to form undercut trenches. Finally, a second etch is provided into the undercut trenches. The charging layer causes the second etch to laterally etch foots in the substrate between the undercut trenches. The footers undercut the substrate to release a portion of the substrate for providing a movable structure between the undercut trenches and above the footers.
Public/Granted literature
- US07524767B2 Method for manufacturing a micro-electro-mechanical structure Public/Granted day:2009-04-28
Information query
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