发明申请
US20070074662A1 Plasma processing apparatus for forming film containing carbons on object to be deposited
审中-公开
用于在待沉积物体上形成含有碳的膜的等离子体处理装置
- 专利标题: Plasma processing apparatus for forming film containing carbons on object to be deposited
- 专利标题(中): 用于在待沉积物体上形成含有碳的膜的等离子体处理装置
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申请号: US11540597申请日: 2006-10-02
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公开(公告)号: US20070074662A1公开(公告)日: 2007-04-05
- 发明人: Toshiyuki Hirota
- 申请人: Toshiyuki Hirota
- 申请人地址: JP TOKYO
- 专利权人: ELPIDA MEMORY, INC.
- 当前专利权人: ELPIDA MEMORY, INC.
- 当前专利权人地址: JP TOKYO
- 优先权: JP2005-290125 20051003
- 主分类号: C23C16/00
- IPC分类号: C23C16/00
摘要:
There is disclosed a plasma processing apparatus for making a gas including hydrocarbon plasma and forming a film including carbons on an object to be coated with a film. The apparatus includes a first reaction chamber for performing a first plasma process on the object to be deposited, a second reaction chamber for performing a second plasma process on an exhaust gas after the first plasma process is performed, and an exhaust pump for exhausting a gas to the outside after the second plasma process is performed. The first reaction chamber is connected to the exhaust pump via the second reaction chamber.
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