发明申请
US20070074662A1 Plasma processing apparatus for forming film containing carbons on object to be deposited 审中-公开
用于在待沉积物体上形成含有碳的膜的等离子体处理装置

  • 专利标题: Plasma processing apparatus for forming film containing carbons on object to be deposited
  • 专利标题(中): 用于在待沉积物体上形成含有碳的膜的等离子体处理装置
  • 申请号: US11540597
    申请日: 2006-10-02
  • 公开(公告)号: US20070074662A1
    公开(公告)日: 2007-04-05
  • 发明人: Toshiyuki Hirota
  • 申请人: Toshiyuki Hirota
  • 申请人地址: JP TOKYO
  • 专利权人: ELPIDA MEMORY, INC.
  • 当前专利权人: ELPIDA MEMORY, INC.
  • 当前专利权人地址: JP TOKYO
  • 优先权: JP2005-290125 20051003
  • 主分类号: C23C16/00
  • IPC分类号: C23C16/00
Plasma processing apparatus for forming film containing carbons on object to be deposited
摘要:
There is disclosed a plasma processing apparatus for making a gas including hydrocarbon plasma and forming a film including carbons on an object to be coated with a film. The apparatus includes a first reaction chamber for performing a first plasma process on the object to be deposited, a second reaction chamber for performing a second plasma process on an exhaust gas after the first plasma process is performed, and an exhaust pump for exhausting a gas to the outside after the second plasma process is performed. The first reaction chamber is connected to the exhaust pump via the second reaction chamber.
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