发明申请
- 专利标题: Salt suitable for an acid generator and a chemically amplified resist composition containing the same
- 专利标题(中): 适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物
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申请号: US11390365申请日: 2006-03-28
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公开(公告)号: US20070078269A1公开(公告)日: 2007-04-05
- 发明人: Yukako Harada , Ichiki Takemoto , Kouji Toishi
- 申请人: Yukako Harada , Ichiki Takemoto , Kouji Toishi
- 申请人地址: JP Tokyo
- 专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人: Sumitomo Chemical Company, Limited
- 当前专利权人地址: JP Tokyo
- 优先权: JP2005-097486 20050330
- 主分类号: C08K5/15
- IPC分类号: C08K5/15 ; C07D313/04 ; C07D313/16
摘要:
The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH2— group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
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