发明申请
- 专利标题： PROTECTIVE LAYER ON OBJECTIVE LENS FOR LIQUID IMMERSION LITHOGRAPHY APPLICATIONS
- 专利标题（中）： 用于液体渗透测绘应用的目标镜头保护层
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申请号： US11548551申请日： 2006-10-11
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公开(公告)号： US20070091288A1公开(公告)日： 2007-04-26
- 发明人: Burn Jeng LIN , David LU
- 申请人： Burn Jeng LIN , David LU
- 申请人地址： TW Hsin-Chu
- 专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人： TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： G03B27/52
- IPC分类号： G03B27/52
摘要：
Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of protective coating (PC). The PC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.
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