发明申请
- 专利标题: Two-stage laser system for aligners
- 专利标题(中): 对准器的两级激光系统
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申请号: US10554537申请日: 2004-04-16
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公开(公告)号: US20070091968A1公开(公告)日: 2007-04-26
- 发明人: Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
- 申请人: Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
- 申请人地址: JP KANAGAWA 254-8567
- 专利权人: KOMATSU LTD.
- 当前专利权人: KOMATSU LTD.
- 当前专利权人地址: JP KANAGAWA 254-8567
- 优先权: JP2003-116924 20030422; JP2003-298286 20030822
- 国际申请: PCT/JP04/05490 WO 20040416
- 主分类号: H01S3/22
- IPC分类号: H01S3/22 ; H01S3/093
摘要:
The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
公开/授权文献
- US08116347B2 Two-stage laser system for aligners 公开/授权日:2012-02-14
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