发明申请
- 专利标题: N-type semiconductor materials for thin film transistors
- 专利标题(中): 用于薄膜晶体管的N型半导体材料
-
申请号: US11263111申请日: 2005-10-31
-
公开(公告)号: US20070096084A1公开(公告)日: 2007-05-03
- 发明人: Deepak Shukla , Diane Freeman , Shelby Nelson , Jeffrey Carey , Wendy Ahearn
- 申请人: Deepak Shukla , Diane Freeman , Shelby Nelson , Jeffrey Carey , Wendy Ahearn
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 主分类号: H01L51/00
- IPC分类号: H01L51/00 ; C07D471/02
摘要:
A thin film transistor comprises a layer of organic semiconductor material comprising a tetracarboxylic diimide naphthalene-based compound having, attached to each of the imide nitrogen atoms, an aromatic moiety, at least one of which moieties is substituted with at least one electron donating group. Such transistors can further comprise spaced apart first and second contact means or electrodes in contact with said material. Further disclosed is a process for fabricating an organic thin-film transistor device, preferably by sublimation deposition onto a substrate, wherein the substrate temperature is no more than 100° C.
公开/授权文献
- US07629605B2 N-type semiconductor materials for thin film transistors 公开/授权日:2009-12-08
信息查询
IPC分类: