发明申请
- 专利标题: Oblique angle etched underlayers for improved exchange biased structures in a magnetoresitive sensor
- 专利标题(中): 斜角蚀刻底层,用于改进磁阻传感器中的交换偏置结构
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申请号: US11283033申请日: 2005-11-17
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公开(公告)号: US20070109692A1公开(公告)日: 2007-05-17
- 发明人: Matthew Carey , Jeffrey Childress , James Freitag , Stefan Maat , Mustafa Pinarbasi
- 申请人: Matthew Carey , Jeffrey Childress , James Freitag , Stefan Maat , Mustafa Pinarbasi
- 专利权人: HITACHI GLOBAL STORAGE TECHNOLOGIES
- 当前专利权人: HITACHI GLOBAL STORAGE TECHNOLOGIES
- 主分类号: G11B5/127
- IPC分类号: G11B5/127
摘要:
A magnetoresistive sensor having improved pinning field strength. The sensor includes a pinned layer structure pinned by exchange coupling with an antiferromagnetic (AFM) layer. The AFM layer is constructed upon an under layer having treated surface with an anisotropic roughness. The anisotropic roughness, produced by an angled ion etch, results in improved pinning strength. The underlayer may include a seed layer and a thin layer of crystalline material such as PtMn formed over the seed layer. The magnetic layer may include a first sub-layer of NiFeCr and a second sub-layer of NiFe formed there over. The present invention also includes a magnetoresistive sensor having a magnetic layer deposited on an underlayer (such as a non-magnetic spacer) having a surface treated with an anisotropic texture. An AFM layer is then deposited over the magnetic layer. The magnetic layer is then strongly pinned by a combination of exchange coupling with the AFM layer and a strong anisotropy provided by the surface texture of the underlayer. Such a structure can be used for example in a sensor having a pinned layer structure formed above the free layer, or in a sensor having an in stack bias structure.
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