发明申请
- 专利标题： Sputtering target and manufacturing method therefor, and optical recording medium and manufacturing method therefor
- 专利标题（中）： 溅射靶及其制造方法以及光记录介质及其制造方法
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申请号： US11602629申请日： 2006-11-20
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公开(公告)号： US20070114129A1公开(公告)日： 2007-05-24
- 发明人: Yoshitaka Hayashi , Noboru Sasa , Hiroshi Miura , Toshishige Fujii , Masayuki Fujiwara , Katsuyuki Yamada , Shinya Narumi , Masaki Kato
- 申请人： Yoshitaka Hayashi , Noboru Sasa , Hiroshi Miura , Toshishige Fujii , Masayuki Fujiwara , Katsuyuki Yamada , Shinya Narumi , Masaki Kato
- 优先权： JP2005-337654 20051122; JP2006-037099 20060214; JP2005-339102 20051124; JP2006-034370 20060210
- 主分类号： C23C14/00
- IPC分类号： C23C14/00
摘要：
To provide a sputtering target used for the formation of a recording layer of a recordable optical recording medium, wherein the sputtering target contains Bi and Fe and the packing density of the sputtering target is greater than 96%, and a recordable optical recording medium manufactured by using the sputtering target, which the recordable optical recording medium is capable of high-density recording even in the blue laser's wavelength range.
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