Invention Application
- Patent Title: VERTICAL TRANSISTOR WITH FIELD REGION STRUCTURE
- Patent Title (中): 具有场地结构的垂直晶体管
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Application No.: US11622429Application Date: 2007-01-11
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Publication No.: US20070117328A1Publication Date: 2007-05-24
- Inventor: Chih-Feng Huang , Tuo-Hsin Chien , Jenn-yu Lin , Ta-yung Yang
- Applicant: Chih-Feng Huang , Tuo-Hsin Chien , Jenn-yu Lin , Ta-yung Yang
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L29/94

Abstract:
A structure of a vertical transistor with field region is provided. The vertical transistor comprises a field-doping region formed in a substrate next to a core region of the vertical transistor By modulating the doping density, length, and geometrical pattern of the field region, and by connecting the field region to respective well of rim core regions of the vertical transistor, the present invention realizes a stable breakdown voltage with short length of the field region. Therefore, the device area and the manufacturing cost can be reduced.
Information query
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