发明申请
US20070121091A1 Extreme ultraviolet reticle protection using gas flow thermophoresis 审中-公开
使用气流热泳法进行极紫外线掩模保护

  • 专利标题: Extreme ultraviolet reticle protection using gas flow thermophoresis
  • 专利标题(中): 使用气流热泳法进行极紫外线掩模保护
  • 申请号: US11572394
    申请日: 2007-01-19
  • 公开(公告)号: US20070121091A1
    公开(公告)日: 2007-05-31
  • 发明人: Michael Sogard
  • 申请人: Michael Sogard
  • 申请人地址: JP Tokyo 100-8331
  • 专利权人: Nikon Corporation
  • 当前专利权人: Nikon Corporation
  • 当前专利权人地址: JP Tokyo 100-8331
  • 优先权: USPCT/US05/25958 20050721
  • 主分类号: G03B27/62
  • IPC分类号: G03B27/62
Extreme ultraviolet reticle protection using gas flow thermophoresis
摘要:
Methods and apparatus for using a flow of a relatively cool gas to establish a temperature gradient between a reticle and a reticle shield to reduce particle contamination on the reticle are disclosed. According to one aspect of the present invention, an apparatus that reduces particle contamination on a surface of an object includes a plate and a gas supply. The plate is positioned in proximity to the object such that the plate, which has a second temperature, and the object, which has a first temperature, are substantially separated by a space. The gas supply supplies a gas flow into the space. The gas has a third temperature that is lower than both the first temperature and the second temperature. The gas cooperates with the plate and the object to create a temperature gradient and, hence, a thermophoretic force that conveys particles in the space away from the object.
信息查询
0/0