发明申请
- 专利标题: IMAGEABLE MEMBERS WITH IMPROVED CHEMICAL RESISTANCE
- 专利标题(中): 具有改善化学电阻的成像成员
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申请号: US11293554申请日: 2005-12-01
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公开(公告)号: US20070128546A1公开(公告)日: 2007-06-07
- 发明人: Shashikant Saraiya , Jayanti Patel , Ting Tao , Kevin Ray , Frederic Mikell , James Mulligan , John Kalamen , Scott Beckley , Eric Clark
- 申请人: Shashikant Saraiya , Jayanti Patel , Ting Tao , Kevin Ray , Frederic Mikell , James Mulligan , John Kalamen , Scott Beckley , Eric Clark
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 主分类号: G03C1/00
- IPC分类号: G03C1/00
摘要:
Both single-layer and multilayer imageable elements have a substrate and at least one imageable layer. The elements can be used to prepare either negative- or positive-working imaged elements, for example as lithographic printing plates. The imageable elements also include a radiation absorbing compound and a solvent-resistant polymer comprising pendant phosphoric acid groups, pendant adamantyl groups, or both. When this polymer comprises pendant adamantyl groups, they are connected to the polymer backbone through a urea or urethane group. The imageable elements have improved chemical resistance and thermal bakeability from the presence of the unique solvent-resistant polymer.
公开/授权文献
- US07247418B2 Imageable members with improved chemical resistance 公开/授权日:2007-07-24
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