Invention Application
- Patent Title: Low pressure vapor phase deposition of organic thin films
- Patent Title (中): 有机薄膜的低压气相沉积
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Application No.: US11655258Application Date: 2007-01-19
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Publication No.: US20070131172A1Publication Date: 2007-06-14
- Inventor: Stephen Forrest , Paul Burrows , Vladimir Ban
- Applicant: Stephen Forrest , Paul Burrows , Vladimir Ban
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.
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