Invention Application
US20070131172A1 Low pressure vapor phase deposition of organic thin films 审中-公开
有机薄膜的低压气相沉积

Low pressure vapor phase deposition of organic thin films
Abstract:
Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.
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