发明申请
- 专利标题: DMOS transistor with optimized periphery structure
- 专利标题(中): 具有优化外围结构的DMOS晶体管
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申请号: US11636668申请日: 2006-12-11
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公开(公告)号: US20070132019A1公开(公告)日: 2007-06-14
- 发明人: Franz Dietz , Michael Graf , Stefan Schwantes
- 申请人: Franz Dietz , Michael Graf , Stefan Schwantes
- 专利权人: ATMEL Germany GmbH
- 当前专利权人: ATMEL Germany GmbH
- 优先权: DEDE102005060521.4 20051209
- 主分类号: H01L29/76
- IPC分类号: H01L29/76
摘要:
A lateral DMOS transistor is disclosed that includes a first region of a first conductivity type, which is surrounded on the sides by a second region of a second conductivity type, whereby a boundary line between both regions has opposite straight sections and curved sections linking the straight sections, and with a first dielectric structure, which serves as a field region and is embedded in the first region and surrounds a subregion of the first region. Whereby the first distance between the first dielectric structure and the boundary line is greater along the straight sections than along the curved sections.
公开/授权文献
- US07521756B2 DMOS transistor with optimized periphery structure 公开/授权日:2009-04-21
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