发明申请
US20070132019A1 DMOS transistor with optimized periphery structure 有权
具有优化外围结构的DMOS晶体管

DMOS transistor with optimized periphery structure
摘要:
A lateral DMOS transistor is disclosed that includes a first region of a first conductivity type, which is surrounded on the sides by a second region of a second conductivity type, whereby a boundary line between both regions has opposite straight sections and curved sections linking the straight sections, and with a first dielectric structure, which serves as a field region and is embedded in the first region and surrounds a subregion of the first region. Whereby the first distance between the first dielectric structure and the boundary line is greater along the straight sections than along the curved sections.
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