发明申请
US20070141511A1 Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
有权
环化合物，光致抗蚀剂组合物和使用其形成光刻胶图案的方法
- 专利标题： Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
- 专利标题（中）： 环化合物，光致抗蚀剂组合物和使用其形成光刻胶图案的方法
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申请号： US11638590申请日： 2006-12-14
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公开(公告)号： US20070141511A1公开(公告)日： 2007-06-21
- 发明人: Kyoung-Mi Kim , Young-Ho Kim , Jin-Baek Kim , Tae-Hwan Oh
- 申请人： Kyoung-Mi Kim , Young-Ho Kim , Jin-Baek Kim , Tae-Hwan Oh
- 优先权： KR2005-123628 20051215
- 主分类号： G03C1/00
- IPC分类号： G03C1/00
摘要：
A photoresist composition includes a cyclic compound, a photoacid generator, and an organic solvent. The cyclic compound includes any one selected from the group consisting of moieties having chemical structures represented by the formulae (1), (2), (3) and (4) set forth herein, and at least one moiety having the chemical structure represented by the formula (9) set forth herein.