发明申请
- 专利标题: Thin-film capacitor and method for fabricating the same, electronic device and circuit board
- 专利标题(中): 薄膜电容器及其制造方法,电子器件和电路板
-
申请号: US11393910申请日: 2006-03-31
-
公开(公告)号: US20070141800A1公开(公告)日: 2007-06-21
- 发明人: Kazuaki Kurihara , Takeshi Shioga , John Baniecki , Masatoshi Ishii
- 申请人: Kazuaki Kurihara , Takeshi Shioga , John Baniecki , Masatoshi Ishii
- 申请人地址: JP Kawasaki
- 专利权人: FUJITSU LIMITED
- 当前专利权人: FUJITSU LIMITED
- 当前专利权人地址: JP Kawasaki
- 优先权: JP2005-366789 20051220
- 主分类号: H01L21/20
- IPC分类号: H01L21/20
摘要:
The thin-film capacitor comprises a capacitor part 20 formed over a base substrate 10 and including a first capacitor electrode 14, a capacitor dielectric film 16 formed over the first capacitor electrode 14, and a second capacitor electrode 18 formed over the capacitor dielectric film 16; leading-out electrodes 26a, 26b lead from the first capacitor electrode 14 or the second capacitor electrode 18 and formed of a conducting barrier film which prevents the diffusion of hydrogen or water; and outside connection electrodes 34a, 34b for connecting to outside and connected to the leading-out electrodes 26a, 26b.
公开/授权文献
信息查询
IPC分类: